Postdoc vacancy: Terahertz microscopy and -imaging on 2D heterostructures

Work Activities
In this project you will work on expanding our terahertz (THz) time domain microspectroscopy and imaging capabilities, and on applying THz (emission) microscopy to study 2D materials and 2D heterostructures. The microscope will use femtosecond lasers to generate and detect terahertz pulses using non-linear optical techniques. You will then apply the THz microscope to measure the properties of 2D materials and 2D heterostructures on micrometer length scales.

The proposed work is part of the Teratom project, led by the Technical University Eindhoven, and financed by National Growth Fund NXTGEN Hightech programme: Future-proof high-tech equipment.

Qualifications
A PhD degree in physics, physical chemistry, or a closely related subject is required for this project. You have to enjoy working with optics and ultrafast lasers and have some affinity with electronics. If you have experience with one or more of the following topics: femtosecond lasers - terahertz time-domain generation and detection - nonlinear optics, this is considered a strong advantage. Very good verbal and written communications skills (in English) are required.

Work environment
The Light/Matter Interaction group focuses on developing the science and technology of new optical and optical/acoustic hybrid metrology modalities for nanolithography applications. Projects include ultra-high frequency photoacoustics for metrology, THz emission spectroscopy, understanding laser damage in semiconductor-industry-relevant materials, and, in this project, THz imaging science and technology for measuring micrometer- and nanometer-scale properties of semiconductors and 2D materials and 2D heterostructures.

The group houses state-of-the-art lab facilities, such as various femtosecond laser systems, at the Advanced Research Center for Nanolithography (ARCNL). The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Science Park Amsterdam, The Netherlands, and is currently housing about 100 scientists and support staff. We offer a dynamic and open environment, and aim to provide the optimum conditions for young scientists to do exciting research leading to high-impact results, which focus on fundamental physics and chemistry challenges, and might also have direct technological relevance.

ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. www.arcnl.nl

Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 2.5 years, with a salary in scale 10 (CAO-OI) and a range of employment benefits. ARCNL assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses. A favorable tax agreement, the ‘30% ruling’, may apply to non-Dutch applicants.

More information?
For further information about the position, please contact:

Paul Planken

Group leader (Light/Matter interaction) & full professor at the University of Amsterdam

Email: p.planken@arcnl.nl

Phone: +31 (0)20-851 7100

Application
You can respond to this vacancy online via the button below.

Online screening may be part of the selection.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

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Postdoc Optomechanical sensing technology

Work Activities
We are seeking a highly motivated postdoctoral researcher to work on cutting-edge optomechanical sensors. The project is part of a close collaboration between the Photonic Forces group at AMOLF, led by Ewold Verhagen, and the group of Simon Gröblacher at TU Delft. The position is embedded in QSTeM, a recently established Testbed for mechanical sensing, where novel sensors are designed, benchmarked, and developed with both academic and industrial partners. The project is mainly carried out at the QSTeM laboratory in Delft, and partly at the AMOLF institute in Amsterdam.

Mechanical resonators can serve as excellent sensors for a wide range of signals such as accelerations and electromagnetic fields, with applications ranging from industrial process control and biomedicine to inertial navigation. Recent progress in ultralow-dissipation nanomechanical platforms and quantum-limited optical measurement and control techniques have enabled mechanical resonators with exquisite sensing properties. This project aims to accelerate the introduction of optomechanical sensor technology to the market. We focus on exploiting the intrinsically high sensitivity of these platforms while addressing critical practical aspects such as robustness, reproducibility, and system integration and packaging. This applied orientation creates an excellent opportunity to explore meaningful research questions while engaging directly with the challenges and needs faced by industry. In addition to conducting research, you will actively contribute to measurements and benchmarking services for external partners, supporting QSTeM’s mission as a reliable and high-performance testing facility.

You will be primarily based at QSTeM’s facility in Delft, working day-to-day alongside the joint teams. This unique facility brings together researchers from AMOLF and TU Delft in a highly interdisciplinary and application-driven setting, focused on advancing optomechanical sensing technologies. The working environment is collaborative and international, offering the opportunity to work closely with both academic teams and industrial partners. At the same time, you will be a full member of the Photonic Forces group at AMOLF, embedded in a rich research and teaching environment studying various topics within nanophotonics and nanomechanics and having access to its state-of-art facilities.

Please send your application at the latest by February 17, 2026.

Qualifications
We seek an excellent candidate with a background in optomechanics, nanophotonics, nano-engineering, or other related fields. Hands-on experience with nanofabrication, quantum optics, or nanomechanics is a plus. You need to have a doctoral degree, or have met all the requirements and will receive the doctoral degree shortly. The successful candidate has a collaborative spirit and will liaise with collaborators. We strongly believe in the benefits of an inclusive and diverse environment, and encourage people from all backgrounds to apply.

Work environment
As mentioned above, the QSTeM project is a joint undertaking under the direction of Dr. Letizia Catalini and coordinated by Prof. Simon Gröblacher at TU Delft and Prof. Ewold Verhagen at AMOLF. The QSTeM team strives to create a positive, collaborative environment for professional development and joint learning, strongly valuing equality, respect, and diversity in all aspects. At AMOLF, it is linked to the Photonic Forces group of Ewold Verhagen, which studies nanomechanics and nanophotonics in devices ranging from photonic crystals and metamaterials to high-quality optomechanical resonators. We investigate the fundamental physics associated with light-matter interactions, which are enhanced through optical field confinement in tailored nanophotonic systems, as well as the applications they allow. Specific topics of interest include topological photonics, non-Hermitian dynamics, and quantum measurement in nano-optomechanical systems. The group combines theory and experiment, including design and nanofabrication. It is part of the Center for Nanophotonics, where multiple groups collaborate on the study and application of light confined to the nanoscale. Within the group as well as within the QSTeM team, we have a strong focus on stimulating development of junior researchers in all professional aspects, as well as collaborations with other researchers and partners. For more information, see www.optomechanics.nl.

AMOLF is a part of NWO-I and initiate and performs leading fundamental research on the physics of complex forms of matter, and to create new functional materials, in partnership with academia and industry. The institute is located at Amsterdam Science Park and currently employs about 140 researchers and 80 support employees. www.amolf.nl

Working conditions

• The working atmosphere at the QSTeM facility in Delft and the AMOLF institute in Amsterdam is largely determined by young, enthusiastic, mostly foreign employees. Communication is informal and runs through short lines of communication.
• The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of 2 years
• Salary is in scale 10 (CAO-OI) which starts at 4.552 Euro’s gross per month, and a range of employment benefits.
• AMOLF assists any new foreign Postdoc with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?
For further information about the position, please contact Ewold Verhagen: verhagen@amolf.nl.

Application
You can respond to this vacancy online via the button below, at the latest by February 17, 2026.

Online screening may be part of the selection.

Diversity code
AMOLF is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

AMOLF has won the NNV Diversity Award 2022, which is awarded every two years by the Netherlands Physical Society for demonstrating the most successful implementation of equality, diversity and inclusion (EDI).

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Beyond extreme ultraviolet light source plasmas: Theory and experiment

Work Activities
This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department aim at an atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) and beyond-EUV light for nanolithography.

In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)].

Background
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about light sources that radiate at even shorter wavelengths below 13.5 nm, which could open up a host of applications in future nanolithography, metrology, as well as biological imaging. There are many open questions: what elements should be used to generate the required radiation? how do we generate as many ‘usable’ photons from the plasma as possible? What are the optimal laser and target properties?

Project goal
The goal of this joint experiment-theory project is to elucidate the properties of beyond-EUV radiating plasmas. The work will entail performing experiments and numerical modeling of plasmas to quantify, for instance, the radiative properties of the plasma, how many fast-moving ions are produced, as well as the efficiency of converting input laser light into the desired photons. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, to work with advanced laser technologies, and to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) an MSc degree in (Applied) Physics
• Knowledge of experimental atomic, plasma and/or laser physics is an asset, especially if combined with strong hands-on laboratory skills
• Programming experience, particularly in Python, is welcomed
• Strong verbal and written communication skills in English are required

Work environment
ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. www.arcnl.nl

Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 3.115 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?
For further information about the position, please contact John Sheil: j.sheil@arcnl.nl.

Application
You can respond to this vacancy online via the button below.

Online screening may be part of the selection.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.

ARCNL PhD Talent Fellowship

Work Activities
The Advanced Research Center for Nanolithography (ARCNL) invites exceptional (top-5%) students to apply for the ARCNL PhD Talent Fellowship. This fellowship is designed to attract top students to conduct pioneering academic research directly inspired by high-tech industry.

Qualifications
We welcome highly talented and motivated candidates who:

• Have an MSc degree in (Applied) Physics or Chemistry, or a related field, or will obtain their degree within three months after the application deadline.
• Have an excellent academic record as proven by results and marks.
• Are self-driven, creative, and capable of independent research.
• Demonstrate strong analytical, experimental and/or computational skills.
• Are team players with a flexible mindset and the ability to collaborate across disciplines.

Work environment
ARCNL is a leading research institute located in Amsterdam, dedicated to advancing the fundamental physics and innovative technologies that drive semiconductor manufacturing. Our research connects ultrafast science, nanophotonics, materials physics, and plasma physics with industrial challenges relevant to next-generation lithography.

ARCNL is organized in three departments (Source, Metrology, and Materials), and the research topics include:

• High-Harmonic Generation and Ultrafast Nanophotonics
• EUV Generation and Plasma Physics
• Nanometrology and Materials Characterization
• Laser-Plasma Interaction and Source Optimization
• 3D Nanostructure Imaging and Scattering Techniques
• Surface Chemistry and Tribology

Our institute combines state-of-the-art laboratories with a dynamic scientific environment, closely connected to ASML and major Dutch academic partners.

Working conditions

• World-class equipment and research infrastructure
• An ambitious and collaborative scientific environment to accelerate your research excellence
• Competitive salary and full-time employment
• A one-year contract, which after positive evaluation is extended for three years.
• Strong links to industry (particularly ASML) and exposure to real-world high-tech challenges
• Dedicated support for your scientific career development and future academic or industrial trajectory

More information?
For further information about the position, please contact dr. Marjan Fretz: m.fretz@arcnl.nl

Application
Application Process

1. Identify your preferred research topic and ARCNL group (www.arcnl.nl) .
2. Contact the relevant group leader to discuss your initial project idea.
3. Develop your proposal in consultation with the group leader.
4. Submit the following documents:

• Curriculum Vitae, incl. contact details for 3 references
• A transcript of grades from BSc and MSc
• 1-page project proposal
• 1-page motivation letter (why this group, why ARCNL, why you, and what motivates you to carry out this research here)

Deadline: January 31, 2026
Application review procedure and timeline: If your proposal is evaluated positively, we will hold an online and an on-site interview: Online interviews: February 2026. On-site visit and interviews: March 2026. Notification of decision: late March – April 2026.

You can respond to this vacancy online via the button below.

We look forward to receiving your application and to working with the next generation of researchers shaping the future of fundamental physics for nanolithography.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.

Postdoc position: Generating short-wavelength radiation from plasma

Work Activities
This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)] – a concept that is most relevant for the current vacancy.

Background
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more energy efficient and more powerful EUV light sources?

Project goal
To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) a PhD in (Applied) Physics
• Knowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills
• Programming experience, particularly in Python, is welcomed
• Strong verbal and written communication skills in English are required

Work environment
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl

Working conditions
The position is a full-time appointment (40 hours per week, 12 months per year) with the Netherlands Foundation for Scientific Research Institutes (NWO-I) for a period of up to three years. The salary is based on scale 10 (CAO-OI) and comes with comprehensive range of employment benefits. Non-Dutch applicants may be eligible for the advantageous 30% tax ruling. ARCNL supports incoming international researchers with housing and visa arrangements and provides reimbursement for travel and furnishing expenses.

We also offer:

• Responsibility over a setup including bespoke droplet generators and unique & state-of-the-art high-energy laser systems
• The ability to improve your experimental and leadership skills in extensive experimental campaigns
• Collaboration with the in-house theory group, allowing you to understand the EUV-emitting plasma through radiation-hydrodynamics simulations
• Large amount of (image) data and a wide range of existing data analysis tools, allowing you to apply and develop your data analysis skills
• Cooperation within a large team of PhD- students and postdocs and close collaboration with a large industrial partner

More information?
For further information about the position, please contact:

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100

Application
You can respond to this vacancy online via the button below.

Please send your:

• Resume
• Motivation letter on why you want to join the group (max. 1 page)

Online screening may be part of the selection.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.