Postdoc position: Generating short-wavelength radiation from plasma

Work Activities
This experiment-oriented postdoctoral position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)] – a concept that is most relevant for the current vacancy.

Background
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more energy efficient and more powerful EUV light sources?

Project goal
To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) a PhD in (Applied) Physics
• Knowledge of experimental laser and/or plasma physics is an asset, especially if combined with strong hands-on laboratory skills
• Programming experience, particularly in Python, is welcomed
• Strong verbal and written communication skills in English are required

Work environment
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl

Working conditions
The position is a full-time appointment (40 hours per week, 12 months per year) with the Netherlands Foundation for Scientific Research Institutes (NWO-I) for a period of up to three years. The salary is based on scale 10 (CAO-OI) and comes with comprehensive range of employment benefits. Non-Dutch applicants may be eligible for the advantageous 30% tax ruling. ARCNL supports incoming international researchers with housing and visa arrangements and provides reimbursement for travel and furnishing expenses.

We also offer:

• Responsibility over a setup including bespoke droplet generators and unique & state-of-the-art high-energy laser systems
• The ability to improve your experimental and leadership skills in extensive experimental campaigns
• Collaboration with the in-house theory group, allowing you to understand the EUV-emitting plasma through radiation-hydrodynamics simulations
• Large amount of (image) data and a wide range of existing data analysis tools, allowing you to apply and develop your data analysis skills
• Cooperation within a large team of PhD- students and postdocs and close collaboration with a large industrial partner

More information?
For further information about the position, please contact:

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100

Application
You can respond to this vacancy online via the button below.

Please send your:

• Resume
• Motivation letter on why you want to join the group (max. 1 page)

Online screening may be part of the selection.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.

ARCNL Excellence Postdoctoral Fellowship

Work Activities
The Advanced Research Center for Nanolithography (ARCNL) invites exceptional researchers from outside ARCNL to apply for the ARCNL Excellence Postdoctoral Fellowship. This fellowship is designed to attract top scientific talent to conduct pioneering research in collaboration with both academia and high-tech industry.

Qualifications
We welcome highly talented and motivated candidates who:

• Hold a PhD in physics or a related field, or will obtain their PhD within one year after the application deadline
• Have an excellent academic and publication record
• Are self-driven, creative, and capable of independent research at the highest level
• Demonstrate strong analytical, experimental and/or computational skills
• Have excellent scientific writing and communication abilities
• Are team players with a flexible mindset and the ability to collaborate across disciplines
• Show potential to supervise MSc/PhD students and manage a research project

Work environment
ARCNL is a leading research institute located in Amsterdam, dedicated to advancing the fundamental physics and innovative technologies that drive semiconductor manufacturing. Our research connects ultrafast science, nanophotonics, materials physics, and plasma physics with industrial challenges relevant to next-generation lithography.

ARCNL is organized in three departments (Source, Metrology, and Materials), and the research topics include:

• High-Harmonic Generation and Ultrafast Nanophotonics
• EUV Generation and Plasma Physics
• Nanometrology and Materials Characterization
• Laser-Plasma Interaction and Source Optimization
• 3D Nanostructure Imaging and Scattering Techniques
• Surface Chemistry and tribology

Our institute combines state-of-the-art laboratories with a dynamic scientific environment, closely connected to ASML and major Dutch academic partners.

Working conditions

• World-class equipment and research infrastructure
• An ambitious and collaborative scientific environment to accelerate your research excellence
• Competitive salary and full-time employment
• A two-year contract, with the opportunity for a one-year extension upon positive evaluation
• Strong links to industry (particularly ASML) and exposure to real-world high-tech challenges
• Dedicated support for your scientific career development and future academic or industrial trajectory

More information?
For further information about the position, please contact dr. Peter Kraus: p.kraus@arcnl.nl

Application
Application Process

1. Identify your preferred research topic and ARCNL group (www.arcnl.nl) .
2. Contact the relevant group leader to discuss your initial project idea.
3. Develop your proposal in consultation with the group leader.
4. Submit the following documents:

• Curriculum Vitae, incl. contact details for 3 references
• List of publications
• 2-page project proposal
• 1-page motivation letter (why this group, why ARCNL, why you, and what motivates you to carry out this research here)

Deadline: January 31, 2026
Application review procedure and timeline: If your proposal is evaluated positively, we will hold an online and an on-site interview: Online interviews: February 2026. On-site visit and interviews: March 2026. Notification of decision: late March – April 2026.

You can respond to this vacancy online via the button below.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.

PhD-position: Next-generation optomechanical sensing

Work Activities
We are seeking a highly motivated PhD student to work on cutting-edge optomechanical sensors. The project is part of a close collaboration between the Photonic Forces group at AMOLF, led by Ewold Verhagen, and the group of Simon Gröblacher at TU Delft. They are participating in QSTeM, a recently established Testbed for mechanical sensing, where novel sensors are designed, benchmarked, and developed with both academic and industrial partners. The project is partly carried out at the QSTeM laboratory in Delft and at the AMOLF institute in Amsterdam.

Mechanical resonators can serve as exquisite sensors for a wide range of signals such as accelerations and electromagnetic fields, with applications ranging from industrial process control and biomedicine to inertial navigation. This project seeks to develop novel sensors with high sensitivity and reliability, incorporating ultralow-dissipation resonators and quantum-limited optical measurement and control techniques. While the project takes an application-oriented approach, we are always fascinated by the fundamental physics aspects of advanced sensor technology. The project is at the interface of multiple fields: nano-engineering, optomechanics, and quantum technology. It has a highly experimental character but features strong ties to the theoretical background of the field.

You will be part of the Photonic Forces group at AMOLF, embedded in a rich research environment studying various topics within nanophotonics and nanomechanics. Prof. Ewold Verhagen will serve as your primary PhD advisor. At the same time, you will work closely with the other researchers in the QSTeM team; a highly interdisciplinary and international setting that brings together academic teams and industrial partners.

We offer an open and collaborative environment in which we focus on hands-on learning and personal growth of all group members. We are looking for excited and talented students, who are eager to develop new skills and engage new experimental and theoretical challenges. During your PhD, you will learn and employ all aspects of research on optomechanical sensors: from conceptual design and modelling to nanofabrication in the cleanroom, and from high-precision optical interferometry to writing papers and presenting your results at international conferences.

Please send your application at the latest by January 2, 2026.

Qualifications
We seek an excellent candidate with a background in physics or engineering, with relevant experience (preferably in quantum optics, photonics, (nano)mechanics or general AMO physics). You will need to meet the requirements for an MSc-degree, to ensure eligibility for a Dutch PhD examination. We strongly believe in the benefits of an inclusive and diverse workplace, and encourage people from all backgrounds to apply.

Work environment
The Photonic Forces team led by prof. Ewold Verhagen studies nanophotonics and nanomechanics. We investigate the fundamental physics associated with photon-phonon interactions in nanostructured devices, as well as the applications they allow. In particular, we explore new ways to measure and control mechanical motion down to the quantum level in optomechanical systems and develop novel sensor technology. All projects in the group involve the use and development of advanced optical measurement techniques and nanofabrication, with extensive support from the group leader and AMOLF technical staff. This project is partly carried out at the QSTeM lab in Delft, in close collaboration with the other team members there. We have a strong focus on stimulating development of students in all professional aspects. We strive to create a diverse and inclusive environment where passion and enjoyment of science can shine. For more information, see www.optomechanics.nl and www.amolf.nl.

Working conditions

• The working atmosphere at the institute is largely determined by young, enthusiastic, mostly foreign employees. Communication is informal and runs through short lines of communication.
• The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years
• The starting salary is 2.968 Euro’s gross per month and a range of employment benefits.
• After successful completion of the PhD research a PhD degree will be granted at Eindhoven University of Technology.
• Several courses are offered, specially developed for PhD-students.
• AMOLF assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?
Prof.dr. Ewold Verhagen
Group leader Photonic Forces
E-mail: verhagen@amolf.nl
Phone: +31 (0)20-754 7100

Application
You can respond to this vacancy online via the button below.
Please annex your:

• Resume;
• Motivation on why you want to join the group (max. 1 page).

It is important to us to know why you want to join our team. This means that we will only consider your application if it entails your motivation letter.

The application deadline closes on January 2, 2026.

Online screening may be part of the selection.

Diversity code
AMOLF is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

AMOLF has won the NNV Diversity Award 2022, which is awarded every two years by the Netherlands Physical Society for demonstrating the most successful implementation of equality, diversity and inclusion (EDI).

Commercial activities in response to this ad are not appreciated.

PhD - student: Measuring charges and fields in semiconductor metrology

Work Activities
In semiconductor devices and materials, electric fields can arise due to doping, laser excitation, and other processes. Measuring these fields and/or the charges that create them, is nontrivial as it is highly undesirable to attach physical electrodes to semiconductor devices just for this purpose. At the same time, the ability to measure these fields is highly interesting as it offers the possibility to apply it as a diagnostic tool for quality control. A non-contact way to measure static or slowly varying electric fields is Electric-Field Induced Second Harmonic generation, or EFISH. In isotropic media, optical second harmonic generation (SHG) is normally not allowed. Static electric fields, however, break inversion symmetry, allowing SHG. This means that SHG can be used as a probe of the local static electric field and charge distribution in a material. EFISH is also direction dependent, in principle allowing for measurement of the electric field vector.

Project goal
In this project you will work towards exploring and understanding EFISH to measure static fields and charge distributions in various materials and structures. For this you will learn to work with (tunable) femtosecond laser pulses generated by the laser systems available in the Light/Matter Interaction groups at ARCN. These laser pulses have high peak power and are therefore ideal for the nonlinear optical EFISH process. You will design your own setup, get acquainted with nonlinear optics, perform experiments on relevant materials, and learn how to analyze your data.

Qualifications
Applicants must hold, or be nearing completion of, a Master’s degree in Physics, Chemistry, Materials Science, or a closely related discipline, in accordance with Dutch university requirements for enrollment in a PhD program. While prior experience with femtosecond lasers is not a prerequisite, it will be considered a distinct advantage. Candidates should demonstrate a strong interest in nonlinear optics, materials science, and chemistry, coupled with excellent critical thinking and innovative problem-solving skills. Proficiency in both written and spoken English is mandatory.

Work environment
ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. www.arcnl.nl

About the Light/Matter Interaction group
The research activities of the Light/Matter Interaction group focus on the (non-)linear optical and terahertz response of materials within the context of photo-acoustics, light-induced damage, and local field measurements.

Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,968 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?
For further information about the position, please contact Prof. dr. P. Planken: p.planken@arcnl.nl

Application
You can respond to this vacancy online via the button below.

Online screening may be part of the selection.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.

PhD - student: Generating short-wavelength radiation from plasma

Work Activities
This fully funded PhD position lies at the interface between fundamental physics and industrial application. It is part of activities in ARCNL’s Source Department. The research activities of the Source Department and its EUV Plasma Processes group aim at the atomic- and molecular-level understanding of the fundamental dynamics in the operation of contemporary and future plasma-based sources of extreme-ultraviolet (EUV) light for nanolithography.

In our group’s research we, for example, uncovered the quantum origins of the generated EUV light [Torretti, Nature Comms. Nature Commun. 11, (2020)], found a universal law for expanding plasma [Sheil, Phys. Rev. Lett. 133, (2024)], and found that less than half the initial droplet volume is present on thin tin sheet targets as used in EUV sources [Liu, Phys. Rev. Appl. 20, (2023)], and work on an alternative EUV source solution [Mostafa, Appl. Phys. Lett. 123, (2023)].

Background
The revolutionary introduction of EUV lithography was the culmination of several decades of collaborative work between industry and science – a Project Apollo of the digital age. The short, 13.5-nm EUV wavelength enables patterning the smallest, smartest, and most energy-efficient features on chips. The required 13.5-nm radiation is generated from plasma that is produced from tiny tin droplets that are heated by powerful laser pulses. At ARCNL, we are now thinking about the next generation of light sources: Can we make more efficient and more powerful EUV sources? Is it possible to make light sources that emit radiation efficiently at even shorter wavelengths?

Project goal
To identify what light source will power the next generation of lithography machines, we need to understand what plasma conditions are optimal for producing light from plasma, but also we need to understand how such plasma should be generated, and what laser technology should be used. You will join an interdisciplinary team of several PhD students and postdocs in ARCNL’s highly cohesive Source Department and have as an objective to design & execute experiments, and work with advanced laser technologies, to understand the emission of light and ions from plasma that you generate.

Qualifications

• You have (or will soon obtain) an MSc degree in (Applied) Physics
• Knowledge of experimental laser physics and/or plasma and fluid mechanics is an asset, especially if combined with strong hands-on laboratory skills
• Programming experience, particularly in Python, is welcomed
• Strong verbal and written communication skills in English are required

Work environment
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), and associate partner the University of Groningen (UG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl

Working conditions
ARCNL offers you:

• Responsibility over a setup including state-of-the-art droplet generators and laser systems
• The ability to improve your experimental skills in extensive experimental campaigns that can be designed with a lot of freedom
• Collaboration with the in-house theory group, allowing you to understand the EUV-emitting plasma through radiation-hydrodynamics simulations
• Large amount of (image) data and a wide range of existing data analysis tools, allowing you to apply and develop your data analysis skills
• Cooperation within a large team of PhD- students and postdocs and with a large industrial partner
• The opportunity to show your work at (international) conferences for industry and academia

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2,968 per month, with annual increases throughout the term of employment, as well as a range of employment benefits including a high-end laptop. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?
For further information about the position, please contact Oscar Versolato:

Dr. Oscar Versolato
Group leader EUV Plasma Processes
E-mail: versolato@arcnl.nl
Phone: +31 (0)20-851 7100

Application
You can respond to this vacancy online via the button below.

Please send your:

• Resume
• Motivation letter on why you want to join the group (max. 1 page)

Online screening may be part of the selection.

There is no deadline for the vacancy which will stay open until it is filled. The first shortlist of candidates is expected to be drafted approximately in December 2025.

Diversity code
ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

Commercial activities in response to this ad are not appreciated.